Yu, Pengmei; Merkx, Marc; Tezsevin, Ilker; Lemaire, Paul C.; Hausmann, Dennis M. et. al. (2024): Data underlying the publication: Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/c357264b-f395-4409-bedc-328f45f6e6ac.v1

Dataset

x choose version: version 2 - 2024-05-02 (latest)

• Theoretical and Computational Chemistry
• Nanotechnology
• Materials Engineering
• Atomic, Molecular, Nuclear, Particle and Plasma Physics
• Chemical Engineering
• Engineering
• Physical Sciences
• Technology
• Chemical Sciences

Area-selective deposition, Atomic layer deposition, Fourier-transform infrared spectroscopy, Small molecule inhibitors, Spectroscopic ellipsometry

CC BY 4.0

RefWorks, BibTeX, Reference Manager, Endnote, DataCite, NLM, DC, CFF

by Pengmei Yu , Marc Merkx , Ilker Tezsevin , Paul C. Lemaire , Dennis M. Hausmann , Tania E. Sandoval , Wilhelmus M. M. Kessels , Adrie Mackus

The publication is focused on unravelling the contributions of two important factors to the blocking performance of small molecule inhibitors: steric shielding and chemical passivation, which was explored both experimentally and theoretically. The dataset contains the raw data, inputs and outputs files for simulations, images and tables for the manuscript.

• 2024-05-02 first online, published, posted

4TU.ResearchData

.tiff, .opju, .m, .dat, .mat, .txt, .png, .fig.

Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation

• Lam Research Corp.
• European Research Council (ERC) under the European Union’s Horizon 2020 research and innovation programme (Grant Agreement No. 949202)
• Dutch Research Council (NWO) Vidi Project 18363
• Chilean National Agency for Research and Development (ANID) FONDECYT 1231197

Eindhoven University of Technology, Department of Applied Physics, The Netherlands;
Universidad Técnica Federico Santa María, Department of Chemical and Environmental Engineering, Santiago, Chile