Isotropic plasma atomic layer etching of Al2O3
doi:10.4121/13011239.v1
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doi: 10.4121/13011239
doi: 10.4121/13011239
Datacite citation style:
Chittock, Nicholas (2020): Isotropic plasma atomic layer etching of Al2O3. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/13011239.v1
Other citation styles (APA, Harvard, MLA, Vancouver, Chicago, IEEE) available at Datacite
Dataset
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Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
history
- 2020-10-21 first online, published, posted
publisher
4TU.ResearchData
associated peer-reviewed publication
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)
funding
- NWO Project 17124 "Atomic Layer Etching: Novel Plasma Processes for Anisotropic ánd Isotropic Etching"
organizations
Eindhoven University of Technology
DATA
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Data_management.xlsx -
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