Isotropic plasma atomic layer etching of Al2O3
DOI:10.4121/13011239.v1
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DOI: 10.4121/13011239
DOI: 10.4121/13011239
Datacite citation style:
Chittock, Nicholas (2020): Isotropic plasma atomic layer etching of Al2O3. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/13011239.v1
Other citation styles (APA, Harvard, MLA, Vancouver, Chicago, IEEE) available at Datacite
Dataset
Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
History
- 2020-10-21 first online, published, posted
Publisher
4TU.ResearchDataAssociated peer-reviewed publication
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)Funding
- NWO Project 17124 "Atomic Layer Etching: Novel Plasma Processes for Anisotropic ánd Isotropic Etching"
Organizations
Eindhoven University of TechnologyDATA
Files (1)
- 825,244 bytesMD5:
4a43abf3e19ea173ab857e7196849c1aData_management.xlsx
