%0 Generic
%A Chittock, Nicholas
%D 2020
%T Isotropic plasma atomic layer etching of Al2O3
%U https://data.4tu.nl/articles/dataset/Isotropic_plasma_atomic_layer_etching_of_Al2O3/13011239/1
%R 10.4121/13011239.v1
%K Etch Rate
%X Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
%I 4TU.ResearchData