TY - DATA
T1 - Isotropic plasma atomic layer etching of Al2O3
PY - 2020/10/21
AU - Nicholas Chittock
UR - https://data.4tu.nl/articles/dataset/Isotropic_plasma_atomic_layer_etching_of_Al2O3/13011239/1
DO - 10.4121/13011239.v1
KW - Etch Rate
N2 - Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
ER -