Isotropic plasma atomic layer etching of Al2O3

doi: 10.4121/13011239.v1
The doi above is for this specific version of this dataset, which is currently the latest. Newer versions may be published in the future. For a link that will always point to the latest version, please use
doi: 10.4121/13011239
Datacite citation style:
Chittock, Nicholas (2020): Isotropic plasma atomic layer etching of Al2O3. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/13011239.v1
Other citation styles (APA, Harvard, MLA, Vancouver, Chicago, IEEE) available at Datacite
Dataset
Eindhoven University of Technology logo
usage stats
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views
154
downloads
keywords
Etch Rate
licence
cc-0.png logo CC0
Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
history
  • 2020-10-21 first online, published, posted
publisher
4TU.ResearchData
funding
  • NWO Project 17124 "Atomic Layer Etching: Novel Plasma Processes for Anisotropic ├índ Isotropic Etching"
organizations
Eindhoven University of Technology

DATA

files (1)