Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma

DOI:10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1
The DOI displayed above is for this specific version of this dataset, which is currently the latest. Newer versions may be published in the future. For a link that will always point to the latest version, please use
DOI: 10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4

Datacite citation style

Bolkenbaas, Olaf; Merkx, Marc; Chittock, Nicholas; Tezsevin, Ilker; Kessels, Wilhelmus M. M. et. al. (2025): Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1
Other citation styles (APA, Harvard, MLA, Vancouver, Chicago, IEEE) available at Datacite

Dataset

Dataset to accompany the publication of a manuscript on Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma. The data contains ellipsometry data of the substrates during plasma exposures and nucleation curves of TiO2 deposition on HfO2, ZnO, Al2O3 and SiO2; Reflection absorption infrared spectra on SiO2 and Al2O3 for different plasma and reactant exposures; and x-ray photoelectron spectra of SiO2 after plasma exposure. Further details can be found in README.txt and the manuscript.


History

  • 2025-07-02 first online, published, posted

Publisher

4TU.ResearchData

Format

.iSE, .dpt, .vgd

Funding

  • European Union’s Horizon 2020 research and innovation programme (grant code Grant Agreement No. 949202) European research council

Organizations

TU Eindhoven, Department of Applied Physics and Science Education, Plasma & Materials Processing

DATA

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