Supporting information to derive the figures of the paper: "Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap"

DOI:10.4121/19181597.v1
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DOI: 10.4121/19181597
Datacite citation style:
Davide Degli Esposti (2022): Supporting information to derive the figures of the paper: "Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap". Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/19181597.v1
Other citation styles (APA, Harvard, MLA, Vancouver, Chicago, IEEE) available at Datacite

Dataset

The data sets provide the necessary information to derive the figures of the paper "Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap"  Preprint at https://arxiv.org/abs/2202.08090

History

  • 2022-04-13 first online, published, posted

Publisher

4TU.ResearchData

Format

jpg, tif, txt, py

Funding

  • QLSI grant EU H2020 agreement No. 951852
  • Army Research Office (Grant No. W911NF-17-1-0274)
  • OTP with project number 16278

Organizations

QuTech and Kavli Institute of Nanoscience, Delft University of Technology

DATA

Files (2)