The doi above is for this specific version of this dataset, which is currently the latest. Newer versions may be published in the future. For a link that will always point to the latest version, please use
doi: 10.4121/c29dd5f3-68bf-4f5a-a159-00f0c1579541

Santoso, Albert; van Ommen, J.Ruud ; van Steijn, Volkert (2024): Dataset for Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/c29dd5f3-68bf-4f5a-a159-00f0c1579541.v1

Dataset

• Nanotechnology
• Chemical Engineering
• Engineering
• Technology

atomic layer deposition, nanolayers, PDMS, polymer

2022

CC BY-NC 4.0

RefWorks, BibTeX, Reference Manager, Endnote, DataCite, NLM, DC, CFF

by Albert Santoso, J.Ruud van Ommen , Volkert van Steijn

The dataset is a basis for a publication of Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS, intended to be of chapter 2 in the corresponding dissertation. In this dataset, the research objective "Exploring the use of atmospheric pressure atomic layer deposition (AP-ALD) in increasing the organic solvent resistance of polydimethylsiloxane flat substrates" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and newly developed barrier property testing). The presented data were in the form of images (jpg.), origin file containing the XPS and barrier property data (opju), table (xls) and graphs (spm).

• 2024-06-04 first online, published, posted

4TU.ResearchData

Origin main file / opju; FESEM images/jpeg; AFM images / jpeg; transmittance value/xls; and ellipsometric file/spm.

Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

• Fast and Efficient Purification of Medical Isotopes by Microfluidic Extraction (grant code 16913) Nederlandse Organisatie voor Wetenschappelijk Onderzoek

TU Delft, Faculty of Applied Sciences, Department of Chemical Engineering