cff-version: 1.2.0
abstract: "<p>The dataset is a basis for a publication of Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS, intended to be of chapter 2 in the corresponding dissertation. In this dataset, the research objective "Exploring the use of atmospheric pressure atomic layer deposition (AP-ALD) in increasing the organic solvent resistance of polydimethylsiloxane flat substrates" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and newly developed barrier property testing). The presented data were in the form of images (jpg.), origin file containing the XPS and barrier property data (opju), table (xls) and graphs (spm).</p>"
authors:
  - family-names: Santoso
    given-names: Albert
  - family-names: van Ommen
    given-names: J.Ruud 
    orcid: "https://orcid.org/0000-0001-7884-0323"
  - family-names: van Steijn
    given-names: Volkert
title: "Dataset for Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS"
keywords:
version: 1
identifiers:
  - type: doi
    value: 10.4121/c29dd5f3-68bf-4f5a-a159-00f0c1579541.v1
license: CC BY-NC 4.0
date-released: 2024-06-04