Supporting information to derive the figures of the paper: "Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap"

doi:10.4121/19181597.v1
The doi above is for this specific version of this dataset, which is currently the latest. Newer versions may be published in the future. For a link that will always point to the latest version, please use
doi: 10.4121/19181597
Datacite citation style:
Davide Degli Esposti (2022): Supporting information to derive the figures of the paper: "Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap". Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/19181597.v1
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Dataset

The data sets provide the necessary information to derive the figures of the paper "Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap"  Preprint at https://arxiv.org/abs/2202.08090

history
  • 2022-04-13 first online, published, posted
publisher
4TU.ResearchData
format
jpg, tif, txt, py
funding
  • QLSI grant EU H2020 agreement No. 951852
  • Army Research Office (Grant No. W911NF-17-1-0274)
  • OTP with project number 16278
organizations
QuTech and Kavli Institute of Nanoscience, Delft University of Technology

DATA

files (2)