*** Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS. ***
Authors: Albert Santoso, Afke J.G. Damen, Volkert van Steijn, and J. Ruud van Ommen

Delft University of Technology
Corresponding author: J. Ruud van Ommen
Contact Information:
j.r.vanommen@tudelft.nl
Delft University of Technology - Department of Chemical Engineering

***General Introduction***
This dataset contains data collected during experiments in increasing PDMS organic resistance using atomic layer deposition at Delft University of Technology, as part of Albert Santoso's PhD Thesis project (2020-2022)

It is being made public both to act as supplementary data for publications and the PhD thesis of Albert Santoso and in order for other researchers to use this data in their own work.

The data in this data set was collected in the laboratories of the Delft University of Technology - Department of Chemical Engineering, and in Kavli cleanroom (Delft University of Technology) between early 2020 to mid 2022.
This research project was made possible by a grant from NWO.

***Purpose of the experiments***
The purpose of these experiments was to explore the use of atmospheric pressure atomic layer deposition (AP-ALD) in increasing the organic solvent resistance of polydimethylsiloxane flat substrates. 

***Measurement equipment***
PDMS and the depositions were fabricated and conducted at Department of Chemical Engineering (Delft). The microscopy images were taken with Scanning Electron Microscopy (Kavli, Delft). 
The transmittance was measured using UV-Vis Spectroscopy at Chemical Engineering Department, while the surfaces were characterized using X-ray photoelectron spectroscopy and Atomic Force Microscopy (at Chemical Engineering Delft) and Ellipsometry (at Kavli, Delft). 
The barrier test was performed by immersing a cured PDMS droplet on silicon wafer in an organic solvent and weighing them at the laboratory (Department of Chemical Engineering, Delft)

***Description of the data in this data set***
Several data were included in this publication, largely divided into two: characterization and barrier test.
Characterization:
along with the spectroscopic results, the XPS profiling and the case studies.The data were labelled accordingly
The FESEM, ellipsometry, transmittance and AFM zip files contained images and spectra for characterization of the nano-layer depositions, organized per samples and labelled.
Barrier test: 
The origin file contained the mass measured during the barrier test performance. 
