TY - DATA T1 - Dataset for Robust surface functionalization of PDMS through atmospheric pressure atomic layer deposition PY - 2024/06/04 AU - Albert Santoso AU - Volkert van Steijn AU - J.Ruud van Ommen UR - DO - 10.4121/77771657-07d7-464b-80da-d6a6a375cabb.v1 KW - PDMS KW - atmospheric pressure atomic layer deposition KW - titanium oxide KW - wettability KW - functionalization N2 -

The dataset is a basis for a publication of Robust surface functionalization of PDMS through atmospheric pressure atomic layer deposition, intended to be of chapter 3 in the corresponding dissertation. In this dataset, the research objective "Evaluating the use of atmospheric pressure atomic layer deposition (AP-ALD) in functionalizing the surface of polydimethylsiloxane flat substrates" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and newly developed barrier property testing). The presented data were in the form of images (jpg.) and origin file containing the XPS and barrier property data (opju).

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