%0 Generic
%A Wang, Shih-Chi
%A van Kampen, Maarten
%A Morgan, Thomas
%D 2021
%T Data underlying the publication Application of a dual-thermopile radical probe to high-flux expanding hydrogen plasmas
%U https://data.4tu.nl/articles/dataset/Data_underlying_the_publication_Application_of_a_dual-thermopile_radical_probe_to_high-flux_expanding_hydrogen_plasmas/16566141/1
%R 10.4121/16566141.v1
%K Plasma Source
%K heat flux sensors
%K hydrogen plasma reaction
%K Plasma materials processing
%K Radical probe experiments
%X Publication information:
Title: Application of a dual-thermopile radical probe to high-flux expanding hydrogen plasmas
Authors: Shih-Chi Wang, Maarten van Kampen, and Thomas W. Morgan
Corresponding author: Shih-Chi Wang
Corresponding ORCID: 0000-0002-1892-5285
Corresponding email address: s.c.wang@differ.nl
Organizations: DIFFER - Dutch Institute for Fundamental Energy Research and ASML
Journal: Plasma Sources Science and Technology
Keywords: cascaded arc source, heat flux sensor, hydrogen plasma, plasma-material processing, radical probe
Resource title: To be determined
Resource DOI: To be determined
Description: This publication concerns experimental work on plasma diagnostics, and the research objective is to measure hydrogen radical flux using a dual-thermopile radical probe. The data collection was carried out by a Keithley 2410 SourceMeter and a GraphTec midi logger GL200A connected to a PC. The collected data is series of numbers and is plotted in the multiple figures of the publication. This replication package contains multiple folders, each of which corresponds to a figure in the publication.
Creation date: 07-Sep-2021
Access right: open access
File formats: text file (.txt), common separated data file (.csv), excel sheet (.xlsx), portable network graphics (.png), and python script (.py).
Software version: Anaconda3-2019.10
Hardware version: Intel(R) Core(TM) i7-8650U CPU, RAM 8.0 GB
%I 4TU.ResearchData