Publication information:
Title: Data underlying the publication Application of a dual-thermopile radical probe to expanding hydrogen plasmas
Authors: Shih-Chi Wang, Ruud van der Horst, Maarten van Kampen, and Thomas W. Morgan
Corresponding author: Shih-Chi Wang
Corresponding ORCID: 0000-0002-1892-5285
Corresponding email address: s.c.wang@differ.nl
Organizations: DIFFER - Dutch Institute for Fundamental Energy Research and ASML
Journal: Plasma Sources Science and Technology
Keywords: cascaded arc source, heat flux sensor, hydrogen plasma, plasma-material processing, radical probe
Resource title: Application of a dual-thermopile radical probe to expanding hydrogen plasmas
Resource DOI: https://doi.org/10.1088/1361-6595/ac71c3
Description: This publication concerns experimental work on plasma diagnostics, and the research objective is to measure hydrogen radical flux using a dual-thermopile radical probe. The data collection was carried out by a McPherson 234/302 with 3mm thick MgF2 window, a Keithley 2410 SourceMeter, and a GraphTec midi logger GL200A. The collected data is series of numbers and is plotted in the multiple figures of the publication. This replication package contains multiple folders, each of which corresponds to a figure in the publication.
Creation date: 31-May-2022
Access right: open access
File formats: text file (.txt), excel sheet (.xlsx), and portable network graphics (.png).
Software version: Anaconda3-2019.10
Hardware version: Intel(R) Core(TM) i7-8650U CPU, RAM 8.0 GB