@misc{https://doi.org/10.4121/b7383943-2ae0-4339-8cbf-657765023fd6.v1,
  doi = {10.4121/b7383943-2ae0-4339-8cbf-657765023fd6.v1},
  url = {},
  author = {Chittock, Nicholas and Mackus, Adrie and Shu, Yi  and Elliott, Simon and Knoops, Harm and Kessels, Erwin },
  keywords = {Plasma isotropic atomic layer etching, GaN, ultrathin films, density functional theory (DFT)},
  title = {Data underlying the publication: Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3  },
  publisher = {4TU.ResearchData},
  year = {2023},
  copyright = {CC0},
}