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Isotropic plasma atomic layer etching of Al2O3

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posted on 21.10.2020, 13:52 by Nicholas Chittock
Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.

Funding

NWO Project 17124 "Atomic Layer Etching: Novel Plasma Processes for Anisotropic ánd Isotropic Etching"

History

Publisher

4TU.ResearchData

Organizations

Eindhoven University of Technology

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